Low-energy electron interaction and focused electron beam-induced deposition of molybdenum hexacarbonyl (Mo(CO)₆)

• Po-Yuan Shih,
• Maicol Cipriani,
• Christian Felix Hermanns,
• Jens Oster,
• Klaus Edinger,
• Armin Gölzhäuser and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2022, 13, 182–191, doi:10.3762/bjnano.13.13

• ; dissociative ionisation; focused electron beam-induced deposition; molybdenum hexacarbonyl; Introduction Studies on Mo-based semiconductor materials for the application as thin films with wafer-scale thickness homogeneity [1] and for solar hydrogen production [2] have attracted interest in the last years. For

Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID)

• Leo Sala,
• Iwona B. Szymańska,
• Céline Dablemont,
• Anne Lafosse and
• Lionel Amiaud

Beilstein J. Nanotechnol. 2018, 9, 57–65, doi:10.3762/bjnano.9.8

• the non-resonant processes, dissociative ionisation and electronic excitation followed by dipolar or neutral dissociation, become more efficient with increasing energy. Fragmentation of perfluorocarboxylate ligands The perfluorobutyrate ligand desorption induced by electron impact is observed by the

Electron beam induced deposition of silacyclohexane and dichlorosilacyclohexane: the role of dissociative ionization and dissociative electron attachment in the deposition process

• Ragesh Kumar T P,
• Sangeetha Hari,
• Krishna K Damodaran,
• Oddur Ingólfsson and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2017, 8, 2376–2388, doi:10.3762/bjnano.8.237

• low-energy electrons under single-collision conditions, it was shown that while appreciable decomposition of DCSCH was affected through DEA, SCH was inert with regards to this process. Dissociative ionisation, on the other hand, leads to similar fragmentation of both these molecules. For reference